Ultra-Scaled AlOx Diffusion Barriers for Multibit HfOx RRAM Operation
For dense very large scale integration (VLSI) of high performance, multibit resistive memory (RRAM), scalability of material dimensions, as well as the operational sensitivity of the RRAM to voltage fluctuations, have to be considered. This report presents the benefits of adding 0.5-nm thick AlO x diffusion barriers at the different electrode interfaces of HfO x . It is found that implementing AlO
