A sequential logic device realized by integration of in-plane gate transistors in InGaAs/InP
An integrated nanoelectronic circuit is fabricated from a high-mobility In0.75Ga0.25As/InP heterostructure. The manufactured device comprises two double in-plane gate transistors with a current channel of 1.1 mu m in length and 100 nm in width. The two transistors are coupled to each other in a configuration that the source of one transistor is directly connected with one in-plane gate of the othe
