Investigation on the Optimization of GaN Etching for FinFET Applications
In the framework of this thesis, the optimization of the etching process of GaN for FinFET applications has been investigated. FinFETs are transistors with a vertical architecture in the shape of fins. These fins are fabricated by etching a pattern into a GaN substrate. The etching is carried out in two steps, a dry etch and a wet etch. In this thesis, these etching steps have been carried out whi
