Structural and magnetic properties of Co-N thin films deposited using magnetron sputtering at 523 K
In this work, we studied cobalt nitride (Co-N) thin films deposited using a dc magnetron sputtering method at a substrate temperature (Ts) of 523 K. We find that independent of the reactive gas flow (RN2 ) used during sputtering, the phases of Co-N formed at this temperature seems to be identical having N at.% ∼ 5. This is contrary to Co-N phases formed at lower Ts. For example at Ts∼ 300 K, an ev
