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The Church of Sweden and the Quest to Bounce Back Better
Civil society organizations have distinctive roles to play in everysociety. They collectively contribute to the very communal fabric thatenables a dynamic social contract, and provide the space and the opportunityfor matters not easily handled in the other spheres of society.In those roles civil society is also a crucial part in the resilience of anysociety and a key force in its capacity to cope
RIFM fragrance ingredient safety assessment, cuminic aldehyde, CAS Registry Number 122-03-2
RIFM fragrance ingredient safety assessment, β-naphthyl anthranilate, CAS Registry Number 63449-68-3
RIFM fragrance ingredient safety assessment, propanedioic acid, 1-(3,3-dimethylcyclohexyl) ethyl, ethyl ester, CAS Registry Number 478695-70-4
RIFM fragrance ingredient safety assessment, ethyl 3-methylthiopropionate, CAS Registry Number 13327-56-5
The existing information supports the use of this material as described in this safety assessment. Ethyl 3-methylthiopropionate was evaluated for genotoxicity, repeated dose toxicity, reproductive toxicity, local respiratory toxicity, phototoxicity/photoallergenicity, skin sensitization, and environmental safety. Data from read-across analog methyl 3-methylthiopropionate (CAS # 13532-18-8) show th
RIFM fragrance ingredient safety assessment, phenylethyl anthranilate, CAS Registry Number 133-18-6
The existing information supports the use of this material as described in this safety assessment. Phenylethyl anthranilate was evaluated for genotoxicity, repeated dose toxicity, developmental and reproductive toxicity, local respiratory toxicity, phototoxicity/photoallergenicity, skin sensitization, and environmental safety. Data from phenylethyl anthranilate and the read-across analog cinnamyl
RIFM fragrance ingredient safety assessment, 1-octen-3-one, CAS Registry Number 4312-99-6
RIFM fragrance ingredient safety assessment, cis-4-decenol, CAS Registry Number 57074-37-0
RIFM fragrance ingredient safety assessment, methyl 2,6,6-trimethylcyclohex-2-ene-1-carboxylate, CAS Registry Number 28043-10-9
RIFM fragrance ingredient safety assessment, 4-methyl-5-thiazoleethanol, CAS Registry Number 137-00-8
RIFM fragrance ingredient safety assessment, 3-methylpentanoic acid, CAS Registry Number 105-43-1
RIFM fragrance ingredient safety assessment, pyridine, 4-decyl-, CAS Registry Number 1815-99-2
RIFM fragrance ingredient safety assessment, methyl 3,4,5,6-tetrahydro-7H-azepin-2-yl ether, CAS Registry Number 2525-16-8
RIFM fragrance ingredient safety assessment, 4-methylpentanoic acid, CAS Registry Number 646-07-1
The existing information supports the use of this material as described in this safety assessment. 4-Methylpentanoic acid was evaluated for genotoxicity, repeated dose toxicity, reproductive toxicity, local respiratory toxicity, phototoxicity/photoallergenicity, skin sensitization, and environmental safety. Data from read-across analog 2-ethylbutyric acid (CAS # 88-09-5) show that 4-methylpentanoi
Rare cancers of unknown etiology : lessons learned from a European multi-center case–control study
Rare cancers together constitute one fourth of cancers. As some rare cancers are caused by occupational exposures, a systematic search for further associations might contribute to future prevention. We undertook a European, multi-center case–control study of occupational risks for cancers of small intestine, bone sarcoma, uveal melanoma, mycosis fungoides, thymus, male biliary tract and breast. In
Strain mapping inside an individual processed vertical nanowire transistor using scanning X-ray nanodiffraction
Semiconductor nanowires in wrapped, gate-all-around transistor geometry are highly favorable for future electronics. The advanced nanodevice processing results in strain due to the deposited dielectric and metal layers surrounding the nanowires, significantly affecting their performance. Therefore, non-destructive nanoscale characterization of complete devices is of utmost importance due to the sm
Local defect-enhanced anodic oxidation of reformed GaN nanowires
Understanding formation and distribution of defects in GaN substrates and device layers is needed to improve device performance in rf and power electronics. Here we utilize conductive atomic force microscopy (c-AFM) for studying defect-related leakage paths in an unintentionally doped GaN film formed by nanowire reformation. A nanoscopic Schottky contact is formed between the c-AFM probe and the G
Archaea in Blood Cultures : Coincidence or Coinfection?
Fine-tuning the metabolic rewiring and adaptation of translational machinery during an epithelial-mesenchymal transition in breast cancer cells
Abstract: Background: During breast cancer progression, the epithelial to mesenchymal transition has been associated with metastasis and endocrine therapy resistance; however, the underlying mechanisms remain elusive. To gain insight into this process, we studied the transition undergone by MCF7-derived cells, which is driven by the constitutive nuclear expression of a MKL1 variant devoid of the a